Kim-Khanh Ho

Title: Kim-Khanh Ho: Innovator in Photoresist Technology

Introduction

Kim-Khanh Ho is a notable inventor based in Fremont, CA. She has made significant contributions to the field of photoresist technology, particularly through her innovative patent. Her work is recognized for its potential applications in various industries, including semiconductor manufacturing.

Latest Patents

Kim-Khanh Ho holds a patent for "Basic quencher/developer solutions for photoresists." This invention involves a basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base. The solution is designed to quench a photo-generated acid within a photoresist and develop the photoresist effectively. The supercritical fluid or liquid solvent may be carbon dioxide, while the base may be a quaternary ammonium salt with side groups that enhance its solubility in carbon dioxide. This innovative approach has the potential to improve the efficiency and effectiveness of photoresist processes.

Career Highlights

Kim-Khanh Ho is currently employed at Intel Corporation, where she continues to advance her research and development efforts. Her work at Intel has positioned her as a key player in the field of semiconductor technology. With her expertise, she contributes to the development of cutting-edge solutions that drive innovation in the industry.

Collaborations

Throughout her career, Kim-Khanh Ho has collaborated with esteemed colleagues, including Shan Christopher Clark and James S Clarke. These collaborations have fostered a dynamic exchange of ideas and have led to advancements in their respective fields.

Conclusion

Kim-Khanh Ho is a pioneering inventor whose work in photoresist technology exemplifies innovation and creativity. Her contributions, particularly her patented solutions, are set to make a lasting impact on the semiconductor industry.