Shan Christopher Clark

Title: Innovations by Shan Christopher Clark

Introduction

Shan Christopher Clark is a notable inventor based in Forest Grove, Oregon. He holds a total of nine patents, showcasing his significant contributions to the field of semiconductor technology. His work primarily focuses on cleaning processes and compositions that enhance the efficiency of semiconductor manufacturing.

Latest Patents

One of his latest patents involves the use of supercritical carbon dioxide to clean residues from semiconductor structures. This innovative method effectively removes resistant residues left during the etching of dielectrics in fluorine-based plasma gases. In another patent, he developed a cleaning composition that includes quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide. This composition is designed to effectively remove photoresist films, buried materials, and metallic residues from semiconductor substrates.

Career Highlights

Throughout his career, Shan has worked with prominent companies such as Intel Corporation and Xerox Corporation. His experience in these leading technology firms has allowed him to refine his expertise in semiconductor processes and cleaning technologies.

Collaborations

Shan has collaborated with several professionals in his field, including Robert P. Meagley and Gary Alan Kneezel. These collaborations have contributed to the advancement of his innovative cleaning methods and compositions.

Conclusion

Shan Christopher Clark's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative approaches to cleaning processes continue to impact the efficiency of semiconductor manufacturing.