The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Dec. 06, 2002
George G. Barclay, Jefferson, MA (US);
Ashish Pandya, Natick, MA (US);
Wang Yueh, Shrewsbury, MA (US);
Anthony Zampini, Westborough, MA (US);
Gary Ganghui Teng, Northborough, MA (US);
Zhibiao Mao, Shrewsbury, MA (US);
George G. Barclay, Jefferson, MA (US);
Ashish Pandya, Natick, MA (US);
Wang Yueh, Shrewsbury, MA (US);
Anthony Zampini, Westborough, MA (US);
Gary Ganghui Teng, Northborough, MA (US);
Zhibiao Mao, Shrewsbury, MA (US);
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Abstract
The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.