Vandana Krishnamurthy

This inventor holds 16 USPTO granted patents and 2 published patent applications and 6 EPO patents. Top assignee: Brewer Science, Inc.. Active years: 1997-2025.

USPTO Granted Patents = 16 (Patent Applications = 2)

% Patents Active = 100.0

EPO Patents = 6 (Patent Applications = 4)

Average Co-Inventor Count = 4.4

ph-index = 7

Forward Citations = 466(Granted Patents)

Company Filing History:

16 out of 191

Brewer Science, Inc.

patents

Years Active: 1997-2025

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12437993 - Adhesion layers for EUV lithography (2025-10-07),

2. 11972948 - Adhesion layers for EUV lithography (2024-04-30),

3. 11817317 - High-silicon-content wet-removable planarizing layer (2023-11-14),

4. RE46841 - Spin-on carbon compositions for lithographic processing (2018-05-14),

5. 9960038 - Processes to pattern small features for advanced patterning needs (2018-05-01),

6. 9249013 - Silicon hardmask layer for directed self-assembly (2016-02-02),

7. 9102129 - Spin-on carbon compositions for lithographic processing (2015-08-11),

8. 8968989 - Assist layers for EUV lithography (2015-03-03),

9. 8895230 - Spin-on carbon compositions for lithographic processing (2014-11-25),

10. 8257910 - Underlayers for EUV lithography (2012-09-04),

11. 6962769 - Anti-reflective coating composition with improved spin bowl compatibility (2005-11-08),

12. 6872506 - Wet-developable anti-reflective compositions (2005-03-29),

13. 6740469 - Developer-soluble metal alkoxide coatings for microelectronic applications (2004-05-25),

14. 5919599 - Thermosetting anti-reflective coatings at deep ultraviolet (1999-07-06),

15. 5892096 - Non-subliming mid-UV dyes and ultra-thin organic arcs having (1999-04-06),

Title: Vandana Krishnamurthy: Innovator in EUV Lithography

Introduction

Vandana Krishnamurthy is a prominent inventor based in Rolla, MO (US). She has made significant contributions to the field of microelectronics, particularly in the area of EUV lithography. With a total of 16 patents to her name, her work has been instrumental in advancing lithographic technologies.

Latest Patents

One of her latest patents focuses on adhesion layers for EUV lithography. This invention provides new lithographic compositions designed for use as EUV adhesion layers. The methods outlined in this patent facilitate the fabrication of microelectronics structures using these compositions. The process involves utilizing an adhesion layer immediately below the photoresist layer. This adhesion layer can be directly applied to the substrate or to any intermediate layers, such as alpha-carbon, spin-on carbon, spin-on silicon hardmask, metal hardmask, or deposited silicon layers. The preferred adhesion layers are formed from spin-coatable, polymeric compositions. This innovative method improves adhesion and effectively reduces or eliminates pattern collapse issues.

Career Highlights

Vandana Krishnamurthy is currently employed at Brewer Science, Inc., where she continues to develop cutting-edge technologies in the field of microelectronics. Her expertise and innovative approach have positioned her as a leader in her field.

Collaborations

Throughout her career, Vandana has collaborated with notable colleagues, including Yubao Wang and Douglas J Guerrero. These partnerships have further enhanced her research and development efforts.

Conclusion

Vandana Krishnamurthy's contributions to EUV lithography and microelectronics are noteworthy. Her innovative patents and collaborative spirit continue to drive advancements in the industry.