The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2005
Filed:
Sep. 11, 2003
Xie Shao, Rolla, MO (US);
Jim D. Meador, Ballwin, MO (US);
Mandar Bhave, Rolla, MO (US);
Vandana Krishnamurthy, Rolla, MO (US);
Kelly A. Nowak, Rolla, MO (US);
Michelle Fowler, Rolla, MO (US);
Shreeram V. Deshpande, Rolla, MO (US);
Xie Shao, Rolla, MO (US);
Jim D. Meador, Ballwin, MO (US);
Mandar Bhave, Rolla, MO (US);
Vandana Krishnamurthy, Rolla, MO (US);
Kelly A. Nowak, Rolla, MO (US);
Michelle Fowler, Rolla, MO (US);
Shreeram V. Deshpande, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0.3% by weight of a strong acid. In another embodiment, the weight ratio of strong acid to weak acid in the composition is from about 0:100 to about 25:75. Examples of preferred weak acid compounds include phenolic compounds (e.g., Bisphenol S, Bisphenol A, α-cyano-4-hydroxycinnamic acid), carboxylic acids (e.g., acetic acid), phosphoric acid, and cyano compounds. The polymer and other ingredients are preferably physically mixed in a solvent system. The resulting compositions are spin bowl compatible (i.e., they do not crosslink prior to the bake stages of the microlithographic processes or during storage at room temperature).