Urupattur C Sridharan

Title: Urupattur C Sridharan: Innovator in Transistor Manufacturing

Introduction

Urupattur C Sridharan is a prominent inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of transistors. With a total of seven patents to his name, Sridharan's work has had a substantial impact on the industry.

Latest Patents

One of his latest patents focuses on reducing or eliminating pre-amorphization in transistor manufacture. This innovative method involves fabricating field effect transistors using carbon-doped silicon layers. The process aims to substantially reduce the diffusion of a doped screen layer formed below a substantially undoped channel layer. It includes forming an in-situ epitaxial carbon-doped silicon substrate that is doped to create the screen layer within the carbon-doped silicon substrate. Additionally, it involves forming a substantially undoped silicon layer above the carbon-doped silicon substrate. The method may also include implanting carbon below the screen layer and forming a thin layer of in-situ epitaxial carbon-doped silicon above the screen layer. The screen layer can be formed either in a silicon substrate layer or the carbon-doped silicon substrate.

Career Highlights

Throughout his career, Urupattur C Sridharan has worked with notable companies such as Suvolta, Inc. and Mie Fujitsu Semiconductor Limited. His expertise in semiconductor technology has allowed him to contribute to various innovative projects and advancements in the field.

Collaborations

Sridharan has collaborated with several talented individuals in the industry, including Pushkar Ranade and Dalong Zhao. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Urupattur C Sridharan is a distinguished inventor whose work in transistor manufacturing has paved the way for advancements in semiconductor technology. His innovative methods and collaborations continue to influence the industry positively.