IDiyas

For the Inventor, By the Inventor

Tokyo, Japan

Tsuneo Torikoshi

USPTO Granted Patents = 15 

Average Co-Inventor Count = 1.8

ph-index = 4

Forward Citations = 30(Granted Patents)


Company Filing History:

goldMedal15 out of 2,508 
 
Ebara Corporation
 patents

Years Active: 2010-2024

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15 patents (USPTO):Explore Patents
1. 12036634 - Substrate processing control system, substrate processing control method, and program (2024-07-16),
2. 11897078 - Polishing apparatus, information processing system, polishing method, and computer-readable storage medium (2024-02-13),
3. 10559277 - Non-transitory computer-readable storage medium storing a program of screen control and semiconductor manufacturing apparatus (2020-02-11),
4. 10478938 - Polishing method and apparatus (2019-11-19),
5. D864978 - Display screen with animated graphic user interface (2019-10-29),
6. D854564 - Display screen with graphical user interface (2019-07-23),
7. D852206 - Display screen with animated graphical user interface (2019-06-25),
8. 9847263 - Substrate processing method including reprocessing rejected wafers (2017-12-19),
9. 9610673 - Polishing method and apparatus (2017-04-04),
10. 9524913 - Polishing method and polishing apparatus (2016-12-20),
11. 8592313 - Polishing method and polishing apparatus (2013-11-26),
12. 8332064 - Polishing method and polishing apparatus, and program for controlling polishing apparatus (2012-12-11),
13. 8165710 - Polishing method, polishing apparatus, and program for controlling polishing apparatus (2012-04-24),
14. 7989348 - Polishing method and polishing apparatus (2011-08-02),
15. 7720562 - Polishing method and polishing apparatus (2010-05-18),

Title: Tsuneo Torikoshi: Innovator in Substrate Processing Technology

Introduction

Tsuneo Torikoshi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 15 patents. His work focuses on improving the efficiency and effectiveness of polishing systems used in various applications.

Latest Patents

Among his latest patents are innovative systems and methods for substrate processing control. One notable patent describes a local polishing system that includes a particle estimation unit for estimating the film thickness distribution of a wafer. This system also features a local polishing region setting unit, a polishing head selection unit, and a polishing recipe generator that utilizes a machine learning model to optimize the polishing process. Another patent outlines a polishing apparatus capable of utilizing a machine learning model to enhance the precision of substrate polishing by analyzing frictional forces and temperature data.

Career Highlights

Tsuneo Torikoshi is currently employed at Ebara Corporation, a leading company in the field of industrial machinery and equipment. His work at Ebara has allowed him to develop cutting-edge technologies that have advanced the capabilities of substrate processing systems. His expertise in this area has made him a valuable asset to the company and the industry as a whole.

Collaborations

Throughout his career, Tsuneo has collaborated with notable colleagues, including Takamasa Nakamura and Kuniaki Yamaguchi. These collaborations have fostered innovation and have contributed to the development of new technologies in substrate processing.

Conclusion

Tsuneo Torikoshi's contributions to substrate processing technology through his patents and work at Ebara Corporation highlight his role as a leading inventor in this field. His innovative approaches continue to shape the future of substrate processing systems.

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