Average Co-Inventor Count = 3.6

ph-index = 17

Forward Citations = 956(Granted Patents)

Forward Citations (Not Self Cited) = 950(Oct 12, 2025)

Inventors with similar research interests:

Location History:

Kokubunji, JP (1984 - 1985)
Hachioji, JP (1986 - 1994)
Oume, JP (1994)
Ohme, JP (1993 - 2001)
Tokyo, JP (2009 - 2013)
Kawasaki, JP (2014)
Ome, JP (1993 - 2015)
Kanagawa, JP (2015 - 2016)
Tsukuba Ibaraki, JP (2018)

Company Filing History:

Renesas Technology Corp.

patents

7 out of 52,711

Kabushiki Kaisha Toshiba

patents

4. 5 out of 7,524

Renesas Electronics Corporation

patents

5. 2 out of 3,192

Dai Nippon Printing Co., Ltd.

patents

6. 1 out of 1,674

Fujitsu Semiconductor Limited

8. 1 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1984-2018

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56 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9958399 - Imaging apparatus and imaging method (2018-05-01),

2. 9229314 - Method of inspecting mask, mask inspection device, and method of manufacturing mask (2016-01-05),

3. 9063098 - Method of inspecting mask, mask inspection device, and method of manufacturing mask (2015-06-23),

4. 8986913 - Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device (2015-03-24),

5. 8912501 - Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method (2014-12-16),

6. 8797524 - Mask inspection method and mask inspection apparatus (2014-08-05),

7. 8699783 - Mask defect inspection method and defect inspection apparatus (2014-04-15),

8. 8488866 - Method of inspecting mask pattern and mask pattern inspection apparatus (2013-07-16),

9. 8435702 - Manufacturing method of semiconductor device and manufacturing method of mask (2013-05-07),

10. 8384888 - Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device (2013-02-26),

11. 7911600 - Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits (2011-03-22),

12. 7630068 - Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same (2009-12-08),

13. 7369703 - Method and apparatus for circuit pattern inspection (2008-05-06),

14. 7361530 - Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light (2008-04-22),

15. 7205222 - Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light (2007-04-17),

Title: Tsuneo Terasawa: Pioneering Inventor from Ome, Japan

Introduction: Tsuneo Terasawa is a renowned inventor hailing from Ome, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tsuneo Terasawa holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over three decades, Tsuneo Terasawa has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Tsuneo Terasawa has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge-sharing that has led to numerous breakthrough inventions.

Conclusion: Tsuneo Terasawa's passion for innovation and his relentless pursuit of technological excellence have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.