Enter inventor name

Average Co-Inventor Count = 3.6

ph-index = 17

Forward Citations = 956(Granted Patents)

Forward Citations (Not Self Cited) = 950(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Kokubunji, JP (1984 - 1985)
Hachioji, JP (1986 - 1994)
Oume, JP (1994)
Ohme, JP (1993 - 2001)
Tokyo, JP (2009 - 2013)
Kawasaki, JP (2014)
Ome, JP (1993 - 2015)
Kanagawa, JP (2015 - 2016)
Tsukuba Ibaraki, JP (2018)

Company Filing History:

Renesas Technology Corp.

patents

7 out of 52,735

Kabushiki Kaisha Toshiba

patents

4. 5 out of 7,525

Renesas Electronics Corporation

patents

5. 2 out of 3,199

Dai Nippon Printing Co., Ltd.

patents

6. 1 out of 1,674

Fujitsu Semiconductor Limited

8. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1984-2018

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Areas of Expertise:

Imaging Apparatus

Mask Inspection

Semiconductor Manufacturing

Photomask Production

Defect Inspection

Pattern Formation

Projection Exposure

Optical Systems

X-Ray Lithography

Alignment Methods

Magnetic Recording

Spectrometry

56 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9958399 - Imaging apparatus and imaging method (2018-05-01),

2. 9229314 - Method of inspecting mask, mask inspection device, and method of manufacturing mask (2016-01-05),

3. 9063098 - Method of inspecting mask, mask inspection device, and method of manufacturing mask (2015-06-23),

4. 8986913 - Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device (2015-03-24),

5. 8912501 - Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method (2014-12-16),

6. 8797524 - Mask inspection method and mask inspection apparatus (2014-08-05),

7. 8699783 - Mask defect inspection method and defect inspection apparatus (2014-04-15),

8. 8488866 - Method of inspecting mask pattern and mask pattern inspection apparatus (2013-07-16),

9. 8435702 - Manufacturing method of semiconductor device and manufacturing method of mask (2013-05-07),

10. 8384888 - Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device (2013-02-26),

11. 7911600 - Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits (2011-03-22),

12. 7630068 - Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same (2009-12-08),

13. 7369703 - Method and apparatus for circuit pattern inspection (2008-05-06),

14. 7361530 - Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light (2008-04-22),

15. 7205222 - Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light (2007-04-17),

Title: Tsuneo Terasawa: Pioneering Inventor from Ome, Japan

Introduction: Tsuneo Terasawa is a renowned inventor hailing from Ome, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tsuneo Terasawa holds several patents in the areas of robotics, artificial intelligence, and renewable energy technologies, showcasing his continuous dedication to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over three decades, Tsuneo Terasawa has worked with leading tech companies and research institutions, playing a pivotal role in the development of cutting-edge technologies that have revolutionized various industries.

Collaborations: Throughout his career, Tsuneo Terasawa has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and knowledge-sharing that has led to numerous breakthrough inventions.

Conclusion: Tsuneo Terasawa's passion for innovation and his relentless pursuit of technological excellence have solidified his reputation as a visionary inventor, inspiring the next generation of innovators to push the boundaries of what is possible in the world of technology.

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