The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Dec. 28, 2004
Applicants:
Tsuneo Terasawa, Ome, JP;
Toshihiko Tanaka, Tokyo, JP;
Ko Miyazaki, Kokubunji, JP;
Norio Hasegawa, Hinode, JP;
Kazutaka Mori, Kokubunji, JP;
Inventors:
Tsuneo Terasawa, Ome, JP;
Toshihiko Tanaka, Tokyo, JP;
Ko Miyazaki, Kokubunji, JP;
Norio Hasegawa, Hinode, JP;
Kazutaka Mori, Kokubunji, JP;
Assignee:
Renesas Technology Corp., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/475 (2006.01);
U.S. Cl.
CPC ...
Abstract
Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.