The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Feb. 18, 2010
Tsuneo Terasawa, Tokyo, JP;
Toshihiko Tanaka, Tokyo, JP;
Hiroyuki Shigemura, Kanagawa, JP;
Hajime Aoyama, Tokyo, JP;
Osamu Suga, Tokyo, JP;
Tsuneo Terasawa, Tokyo, JP;
Toshihiko Tanaka, Tokyo, JP;
Hiroyuki Shigemura, Kanagawa, JP;
Hajime Aoyama, Tokyo, JP;
Osamu Suga, Tokyo, JP;
Renesas Electronics Corporation, Kanagawa, JP;
Fujitsu Semiconductor Limited, Kanagawa, JP;
Abstract
A inspection image data of the chip A is captured and the data representing the amount of correction of flare corresponded to the chip A is appropriately loaded from the map storage block. Next, a inspection image of the chip A' is captured, and the data representing the amount of correction of flare corresponded to the chip A′ is loaded from the flare map storage block as the amount of shifting of the edge of the contour of the pattern. The amount of correction is converted, by a correction data generation block which is a correction data generator, into the amount of geometrical correction of pattern which provides correction data. In the comparison block, the images of the geometry of two chips are compared and corrected on the amount of correction of flare generated by a correction data generation block, to thereby judge whether defect is found or not.