Location History:
- Kokubunji, JP (2011)
- Tokyo, JP (2005 - 2013)
- Kanagawa, JP (2015 - 2016)
Company Filing History:
4 out of 7,525 
3 out of 52,735 
2 out of 3,781 
Years Active: 2005-2016
Title: The Innovations of Osamu Suga
Introduction
Osamu Suga is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of mask inspection technology, holding a total of 7 patents. His work focuses on enhancing the precision and efficiency of mask manufacturing processes, particularly in the realm of extreme ultraviolet lithography (EUVL).
Latest Patents
Suga's latest patents include a method of inspecting masks, a mask inspection device, and a method of manufacturing masks. These innovations provide a high-sensitivity approach to detecting phase defects in mask blanks and those remaining after the manufacturing of EUVL masks. The method involves irradiating EUV light with specific illumination numerical apertures (NA) during inspections, utilizing a dark-field imaging optical system that incorporates shielding portions to enhance detection accuracy.
Career Highlights
Throughout his career, Osamu Suga has worked with notable companies such as Renesas Electronics Corporation and Toshiba Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in mask inspection and manufacturing.
Collaborations
Suga has collaborated with esteemed colleagues, including Tsuneo Terasawa and Toshihiko Tanaka. Their combined expertise has contributed to advancements in the field of semiconductor manufacturing.
Conclusion
Osamu Suga's contributions to mask inspection technology have significantly impacted the semiconductor industry. His innovative methods and devices continue to enhance the precision of manufacturing processes, showcasing his dedication to advancing technology.