The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2008

Filed:

Aug. 10, 2006
Applicants:

Atsuko Yamaguchi, Kodaira, JP;

Tsuneo Terasawa, Ome, JP;

Tadashi Otaka, Hitachinaka, JP;

Takashi Iizumi, Hitachinaka, JP;

Osamu Komuro, Hitachinaka, JP;

Inventors:

Atsuko Yamaguchi, Kodaira, JP;

Tsuneo Terasawa, Ome, JP;

Tadashi Otaka, Hitachinaka, JP;

Takashi Iizumi, Hitachinaka, JP;

Osamu Komuro, Hitachinaka, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/48 (2006.01); H04N 7/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.


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