Company Filing History:
4 out of 116 
4 out of 278 Years Active: 2021-2022
Title: The Innovative Contributions of Tsai Wen Sung
Introduction
Tsai Wen Sung is a prominent inventor based in Fremont, CA, known for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, he has made remarkable advancements in processes related to workpiece treatment and material removal.
Latest Patents
One of Tsai Wen Sung's latest patents focuses on the processing of workpieces using a deposition process and etch process. This patent describes an apparatus, systems, and methods for conducting an etch removal process on a workpiece. The method involves generating a plasma from a deposition process gas in a plasma chamber to deposit a passivation layer on specific layers of a high aspect ratio structure. Additionally, it includes generating a plasma from an etch process gas to remove certain layers from the high aspect ratio structure, allowing for the removal of silicon nitride layers at a faster etch rate than silicon dioxide layers. Another notable patent addresses the silicon mandrel etch after native oxide punch-through, detailing methods for conducting a silicon-containing material removal process on a workpiece. This method includes generating species from a process gas in a chamber and introducing a fluorine-containing gas to create a mixture that exposes a silicon structure of the workpiece for material removal.
Career Highlights
Throughout his career, Tsai Wen Sung has worked with notable companies in the semiconductor industry, including Beijing E-town Semiconductor Technology Co., Ltd and Mattson Technology, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.
Collaborations
Tsai has collaborated with talented individuals such as Chun Yan and Michael Xiaoxuan Yang, further enhancing his work and contributions to semiconductor technology.
Conclusion
Tsai Wen Sung's innovative work in semiconductor processes and material removal has established him as a key figure in the industry. His patents reflect a deep understanding of complex technologies and a commitment to advancing the field.
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