Higashihiroshima, Japan

Toshiyasu Fujimoto

USPTO Granted Patents = 5 

Average Co-Inventor Count = 1.8

ph-index = 1


Company Filing History:


Years Active: 2022-2024

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5 patents (USPTO):Explore Patents

Title: **The Innovations of Toshiyasu Fujimoto**

Introduction

Toshiyasu Fujimoto is a distinguished inventor based in Higashihiroshima, Japan, known for his significant contributions to the field of semiconductor technology. With a total of five patents to his name, Fujimoto's inventive prowess has been instrumental in advancing semiconductor devices and memory technologies.

Latest Patents

Fujimoto's latest patents demonstrate his expertise in semiconductor devices. One of his notable inventions is a **semiconductor device having a word line embedded in a gate trench**. This innovative apparatus includes a semiconductor substrate equipped with source/drain regions and a gate trench situated between them. The gate electrode, which is embedded in the gate trench via a gate insulating film, comprises a first polycrystalline silicon film located at the trench's bottom, doped with boron, stacked with a metal film.

Another significant patent is for a **semiconductor memory device including a trench gate structure and method of forming the same**. This device comprises a semiconductor substrate featuring a line-shaped trench covered with an insulating film. The inventive design incorporates a first conductive member with first and second line-shaped portions, with various conductive members extending along the trench’s inner wall, enhancing the memory device's efficiency and performance.

Career Highlights

Fujimoto's career is marked by his role at Micron Technology Incorporated, where his groundbreaking work continues to influence modern semiconductor designs. His inventions not only support advancements in technology but also underscore his commitment to innovation in the semiconductor field.

Collaborations

Throughout his career, Fujimoto has collaborated with talented professionals such as Takashi Sasaki and Shinobu Terada. These partnerships have fostered a collaborative environment, facilitating the sharing of knowledge and ideas that have led to the development of cutting-edge technologies in semiconductors.

Conclusion

Toshiyasu Fujimoto's contributions through his patents reflect his dedication to innovation in the semiconductor industry. His work at Micron Technology Incorporated and collaborations with other experts highlight the importance of teamwork in driving technological advancements. As the field of semiconductors continues to evolve, Fujimoto’s inventions are sure to play a pivotal role in shaping the future of this critical technology.

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