Hirakata, Japan

Toshihisa Isono

This inventor holds 7 USPTO granted patents and 3 published patent applications. Top assignee: C.uyemura Co., Ltd.. Active years: 2007-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihisa Isono. Retrieved from https://idiyas.com/inventor/toshihisa-isono

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 19(Granted Patents)


Location History:

  • Hirakata, JP (2007 - 2015)
  • Osaka, JP (2017)

Company Filing History:


Years Active: 2007-2017

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Toshihisa Isono

Introduction

Toshihisa Isono is a prominent inventor based in Hirakata, Japan. He has made significant contributions to the field of plating methods and electroplating technologies. With a total of 7 patents to his name, Isono's work has had a substantial impact on the manufacturing processes of printed circuit boards.

Latest Patents

Isono's latest patents include a novel plating method that addresses defects in metal filling through holes in printed boards. This invention improves the quality of the plating process by adjusting the angle of the plating solution spray and the posture of the printed board during metal precipitation. Another notable patent is for an electrolytic copper plating bath designed for circuit boards that feature both through holes and blind via holes. This innovative bath ensures adequate covering power and plugging performance, utilizing a combination of water-soluble copper salt, sulfuric acid, and chloride ions, along with a specialized leveler derived from a polyamide polyamine.

Career Highlights

Isono is currently employed at C. Uyemura Co., Ltd., where he continues to develop advanced technologies in the field of electroplating. His expertise and innovative mindset have positioned him as a key figure in the industry, contributing to the advancement of manufacturing techniques.

Collaborations

Throughout his career, Isono has collaborated with notable colleagues such as Naoyuki Omura and Shinji Tachibana. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Toshihisa Isono's contributions to the field of plating and electroplating are noteworthy and reflect his dedication to innovation. His patents not only enhance manufacturing processes but also pave the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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