Amagasaki, Japan

Toshihiko Shiozawa


Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 190(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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6 patents (USPTO):Explore Patents

Title: The Innovative Journey of Toshihiko Shiozawa

Introduction

Toshihiko Shiozawa, a distinguished inventor based in Amagasaki, Japan, has made significant contributions to the field of plasma processing technology. With six patents to his name, Shiozawa's work is integral to advancements in semiconductor manufacturing and material processing.

Latest Patents

Among his latest innovations, Shiozawa developed a **plasma oxidation processing method**, a process that allows for the formation of a silicon oxide film within a plasma processing apparatus. This method utilizes plasma generated under specific conditions to oxidize a processing object characterized by patterned irregularities. The sophisticated technique ensures that the oxygen content in the process gas remains between 0.5% and 10%, while the process pressure is maintained between 1.3 to 665 Pa.

Another notable patent is the **pattern forming method and semiconductor device manufacturing method**. This involves preparing a target object that includes silicon with an initial pattern and executing a plasma oxidation process on its surface. This innovative approach not only forms a silicon oxide film but also allows for its repeated removal, enabling the production of more refined patterns on the target object, ultimately achieving a final pattern width finer than the initial one.

Career Highlights

Shiozawa has built a robust career in the field, working with prominent organizations such as Tokyo Electron Limited and Nagoya University. His expertise and innovative mindset have positioned him at the forefront of semiconductor processing research.

Collaborations

Throughout his career, Toshihiko Shiozawa has collaborated with talented individuals, including Yoshiro Kabe and Junichi Kitagawa. Together, they have pushed the boundaries of what is possible in the realm of plasma technology and semiconductor manufacturing.

Conclusion

Toshihiko Shiozawa's contributions to plasma processing and semiconductor technology highlight his status as a leading inventor. With a track record of innovative patents and fruitful collaborations, he continues to influence the field and inspire future advancements in material processing.

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