Location History:
- Itami, JP (1996 - 1997)
- Tokyo, JP (2000 - 2020)
Company Filing History:
8 out of 15,928 
6 out of 21,351 
Years Active: 1996-2020
Title: The Innovations of Toshihiko Shiga
Introduction
Toshihiko Shiga is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work has been instrumental in advancing the efficiency and functionality of semiconductor devices.
Latest Patents
One of his latest patents involves a semiconductor device that includes a substrate, a heat generating portion, and a cap substrate. This innovative design features a reflection film that reflects medium wavelength infrared rays, helping to suppress temperature increases on the cap substrate side. This is particularly beneficial when mold resin is applied to the cap substrate, as it prevents overheating. Another notable patent describes a semiconductor device with a hexagonal crystalline structure and conductive films. The first conductive film has a unique crystalline structure, while the second film is polycrystalline with a grain size no larger than 15 micrometers, enhancing the device's performance.
Career Highlights
Throughout his career, Toshihiko Shiga has worked with leading companies in the industry, including Mitsubishi Electric Corporation and Mitsubishi Denki Kabushiki Kaisha. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Toshihiko has collaborated with notable coworkers such as Hitoshi Sakuma and Tomoki Oku. Their combined expertise has contributed to the successful development of various semiconductor technologies.
Conclusion
Toshihiko Shiga's contributions to semiconductor technology are noteworthy, with a total of 14 patents that reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements in semiconductor devices.