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For the Inventor, By the Inventor

Osaka, Japan

Toshihide Yoshida

This inventor holds 23 USPTO granted patents and 8 published patent applications, primarily in Fluid Control Technology. Top assignees: Fujikin Inc., Tokyo Electron Limited, Tohoku University. Active years: 2012-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshihide Yoshida. Retrieved from https://idiyas.com/inventor/toshihide-yoshida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 78.3

Average Co-Inventor Count = 5.8

ph-index = 5

Forward Citations = 71(Granted Patents)


Company Filing History:

goldMedal23 out of 450 
 
Fujikin Inc.
 patents
silverMedal7 out of 10,933 
 
Tokyo Electron Limited
 patents
bronzeMedal5 out of 1,054 
 
Tohoku University
 patents
where one patent can have more than one assignee

Years Active: 2012-2025

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Areas of Expertise:
Fluid Control Device
Flow Rate Control
Valve Device
Semiconductor Manufacturing
Fluid Supply System
Pressure-Type Controller
Flow Rate Adjusting Method
Flow Control Apparatus
Gasket Type Orifice
Flow Controller
Adjustment Information Generating
Liquid Discharge Method
23 patents (USPTO):Explore Patents
1. 12209679 - Fluid control device, fluid supply system, and fluid supply method (2025-01-28),
2. 11873916 - Fluid control device, fluid supply system, and fluid supply method (2024-01-16),
3. 11598430 - Valve device, flow rate control method, fluid control device, semiconductor manufacturing method, and semiconductor manufacturing apparatus using the valve device (2023-03-07),
4. 11569101 - Fluid supply device and fluid supply method (2023-01-31),
5. 11512993 - Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method (2022-11-29),
6. 11506290 - Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method (2022-11-22),
7. 11322372 - Fluid supply device and liquid discharge method of this device (2022-05-03),
8. 11242934 - Valve device (2022-02-08),
9. 11187346 - Valve device, its control device, control methods using the same, fluid control device and semiconductor manufacturing apparatus (2021-11-30),
10. 11098819 - Valve device, flow control method using the same, and semiconductor manufacturing method (2021-08-24),
11. 11022224 - Valve device, flow control method using the same, and semiconductor manufacturing method (2021-06-01),
12. 10372145 - Pressure-type flow rate control device (2019-08-06),
13. 9921089 - Flow rate range variable type flow rate control apparatus (2018-03-20),
14. 9625047 - Flow control valve for flow controller (2017-04-18),
15. 9383758 - Flow rate range variable type flow rate control apparatus (2016-07-05),

Title: The Innovative Journey of Toshihide Yoshida

Introduction: Toshihide Yoshida, a pioneering inventor hailing from Osaka, Japan, has made significant contributions to the world of technology and innovation.

Latest Patents: Toshihide Yoshida's latest patents include groundbreaking inventions in the fields of robotics, artificial intelligence, and sustainable energy solutions.

Career Highlights: With a career spanning over two decades, Toshihide Yoshida has established himself as a leading figure in the tech industry, known for his innovative thinking and problem-solving skills.

Collaborations: Throughout his career, Toshihide Yoshida has collaborated with top research institutions, universities, and tech companies to bring his inventions to life and make a lasting impact on society.

Conclusion: Toshihide Yoshida's relentless pursuit of innovation and his passion for creating a better future through technology continue to inspire the next generation of inventors and entrepreneurs worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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