Toshiaki Motonaga is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His innovative work focuses on enhancing the performance and efficiency of photomasks used in various applications.

Latest Patents

Motonaga's latest patents include a photomask with a dust-proofing device and an exposure method utilizing this technology. The objective of this invention is to provide a photomask that features high ultraviolet transmittance in the short wavelength region and excellent light resistance, eliminating the need for inert gas substitution. The design involves overlapping a transparent substrate on the light-shading film pattern surface of the photomask, ensuring a tight application by removing air between the two layers. Another notable patent is for a halftone phase shift photomask and its blank, which consists of a transparent substrate and a halftone phase shift layer. This layer contains molybdenum silicide and is formed as a multilayer film, enhancing the photomask's functionality.

Career Highlights

Throughout his career, Toshiaki Motonaga has worked with notable companies, including Dai Nippon Printing Co., Ltd. His expertise in photomask technology has positioned him as a key figure in the industry, contributing to advancements that benefit various sectors.

Collaborations

Motonaga has collaborated with esteemed colleagues such as Hiro-o Nakagawa and Junji Fujikawa. These partnerships have fostered innovation and development in the field of photomask technology.

Conclusion

Toshiaki Motonaga's contributions to photomask technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His work continues to influence advancements in technology and manufacturing processes.

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