The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2005
Filed:
Nov. 06, 2002
Toshiaki Motonaga, Tokyo, JP;
Hiro-o Nakagawa, Tokyo, JP;
Toshiaki Motonaga, Tokyo, JP;
Hiro-o Nakagawa, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
It is an object of the present invention to provide a photomask equipped with a dust-proofing device which has high ultraviolet transmittance in a short wavelength region and high light resistance and is free from the necessity of the substitution with inert gas and also to, provide an exposure method using this photomask. The photomask equipped with a dust-proofing device is produced by overlapping a ultraviolet ray-transmittable transparent substrate on the side of the light-shading film pattern surface of the photomask to apply the photomask to the transparent substrate tightly by exhausting and removing the air present between the photomask and the transparent substrate. A transparent film which transmits ultraviolet rays maybe formed on the surface of the photomask on the side of a light-shading film pattern surface and a ultraviolet ray-transmittable transparent substrate may be overlapped on the transparent film to apply the photomask to the transparent substrate tightly by exhausting and removing the air present between the transparent film and the transparent substrate.