The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2004
Filed:
Apr. 03, 2001
Applicant:
Inventors:
Toshiaki Motonaga, Tokyo, JP;
Norihito Ito, Tokyo, JP;
Chiaki Hatsuta, Tokyo, JP;
Junji Fujikawa, Tokyo, JP;
Naoya Hayashi, Tokyo, JP;
Toshio Onodera, Fujisawa, JP;
Takahiro Matsuo, Fujisawa, JP;
Toru Ogawa, Kawasaki, JP;
Keisuke Nakazawa, Tokyo, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
In a halftone phase shifting photomask , having a pattern of halftone phase shifting film containing at least chromium and fluorine, the halftone phase shifting film is heat-treated at a temperature between 250° C. and 500° C. so that a change of the optical property of the film produced by the application of excimer laser for exposure to the film is decreased.