Location History:
- Yasu-gun, Siga-ken, JP (1991)
- Tokyo-to, JP (1997 - 2005)
- Tokyo, JP (1996 - 2012)
Company Filing History:
10 out of 3,192 
1 out of 15,844 
2 out of 832,680 Years Active: 1991-2012
Title: Junji Fujikawa: Innovator in Photomask Technology
Introduction
Junji Fujikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photomask technology, holding a total of 12 patents. His innovative work has advanced the processes involved in photolithography, which is crucial for semiconductor manufacturing.
Latest Patents
Fujikawa's latest patents include the development of a gradated photomask and its fabrication process. This invention aims to reduce the number of photolithography steps required, utilizing a generally available photomask blank. It prevents the reflectance of a light shield film from increasing, simplifies alignment during the formation of a semitransparent film, and ensures good step coverage on the light shield pattern. The photomask consists of a light shield area with a light shield film on a transparent substrate, a semitransparent film that transmits photolithographic light, and areas that are either semi-transparent or transmissive. Notably, the semitransparent film has an antireflection function with respect to photolithographic light.
Another significant patent is the halftone phase shift photomask and its blank. This invention features a transparent substrate with a halftone phase shift layer that includes molybdenum silicide as a major component. The multilayer film is designed to enhance the performance of the photomask, which is essential for high-precision semiconductor fabrication.
Career Highlights
Fujikawa has worked with notable companies, including Dai Nippon Printing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in photomask technology and contribute to various advancements in the field.
Collaborations
Throughout his career, Fujikawa has collaborated with esteemed colleagues such as Hiroshi Mohri and Toshifumi Yokoyama. These partnerships have fostered innovation and have been instrumental in the development of new technologies in photomask design.
Conclusion
Junji Fujikawa's contributions to photomask technology have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a leading inventor in this critical field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.