The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2004
Filed:
Dec. 21, 2001
Applicant:
Inventors:
Kenji Noguchi, Tokyo, JP;
Toshiaki Motonaga, Tokyo, JP;
Hiro-o Nakagawa, Tokyo, JP;
Yasutaka Morikawa, Tokyo, JP;
Toshifumi Yokoyama, Tokyo, JP;
Takashi Tominaga, Tokyo, JP;
Yoshinori Kinase, Tokyo, JP;
Junji Fujikawa, Tokyo, JP;
Yoichi Takahashi, Tokyo, JP;
Assignee:
Dainippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A photomask is produced which enables the simplification of the steps of lithography. A photomask is provided with shielding patterns made of shielding metallic thin film on a transparent substrate, wherein the photomask further comprises translucent patterns mainly including tantalum of materials selected from tantalum silicide, tantalum oxide, tantalum nitride or mixture thereof.