Tokyo-to, Japan

Yasutaka Morikawa


 

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Tokyo, JP (2004 - 2007)
  • Tokyo-to, JP (2011 - 2020)

Company Filing History:


Years Active: 2004-2020

Loading Chart...
Loading Chart...
8 patents (USPTO):Explore Patents

Title: Yasutaka Morikawa: Innovator in Photomask Technology

Introduction

Yasutaka Morikawa is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photomask technology, holding a total of 8 patents. His work focuses on enhancing the manufacturing processes and correcting photomasks, which are essential in the semiconductor industry.

Latest Patents

One of Morikawa's latest patents is titled "Photomask and methods for manufacturing and correcting photomask." This invention provides a halftone mask that includes an assist pattern and a manufacturing method utilizing an ArF excimer laser as an exposing source. The method is designed for projection exposure using off-axis illumination, ensuring that the assist pattern remains unresolved while maintaining the focal depth magnification effect. The photomask consists of a main pattern transferred to a target surface and an assist pattern formed nearby, both made from a semi-transparent film of the same material. This innovation generates specific retardation effects between the light transmitted through the main pattern and the assist pattern, enhancing the quality of the transferred image.

Career Highlights

Yasutaka Morikawa is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in advancing photomask technologies. His expertise and innovative approaches have positioned him as a key figure in the industry.

Collaborations

Morikawa has collaborated with notable coworkers, including Takaharu Nagai and Hiroshi Mohri. Their combined efforts have contributed to the development of cutting-edge technologies in photomask manufacturing.

Conclusion

Yasutaka Morikawa's contributions to photomask technology exemplify his innovative spirit and dedication to advancing the semiconductor industry. His patents reflect a deep understanding of the complexities involved in photomask manufacturing and correction.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…