Tokyo-to, Japan

Toshifumi Yokoyama


Average Co-Inventor Count = 4.4

ph-index = 6

Forward Citations = 94(Granted Patents)


Location History:

  • Shinjuku-Ku, JP (1999)
  • Tokyo, JP (1998 - 2004)
  • Tokyo-to, JP (2002 - 2005)
  • Saitama, JP (2005)

Company Filing History:


Years Active: 1998-2005

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10 patents (USPTO):Explore Patents

Title: Toshifumi Yokoyama: Innovator in Photomask Fabrication

Introduction

Toshifumi Yokoyama is an accomplished inventor based in Tokyo-to, Japan, known for his contributions to the field of photomask technology. With a total of 10 patents to his name, his work has significantly impacted the precision of photomask fabrication processes used in semiconductor manufacturing.

Latest Patents

Yokoyama's latest patents reflect his innovative approach to solving complex issues in photomask technology. His first significant invention, "Method and apparatus for photomask fabrication," offers novel methods and apparatuses designed to control critical dimension (CD) uniformity of photomasks. This invention neutralizes CD variations that are often associated with pattern density and process fluctuations, thereby enhancing production efficiency.

Another noteworthy patent is the "Halftone phase shift photomask and blank for halftone phase shift photomask." This invention introduces a blank for halftone phase shift photomasks that comprises a transparent substrate alongside a halftone phase shift layer. This layer contains molybdenum silicide as its major component, and either or both oxygen and nitrogen. The multilayer film design enhances performance and is essential for the advancement of photomask technologies.

Career Highlights

Yokoyama has collaborated with leading companies in the industry, including Dai Nippon Printing Co., Ltd. and Intel Corporation. His tenure at these companies has provided him with the experience and expertise necessary to innovate and develop groundbreaking technologies in photomask fabrication.

Collaborations

Throughout his career, Toshifumi Yokoyama has worked alongside talented individuals like Yoshinori Kinase and Junji Fujikawa. These collaborations have fostered an environment of innovation, allowing him to advance the field of photomask technology significantly.

Conclusion

Toshifumi Yokoyama stands out as a key inventor in the field of photomask technology, with his patents contributing to advancements that improve critical dimensions in semiconductor manufacturing. His work continues to influence the industry, showcasing the vital role of inventors in driving innovation.

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