The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2003
Filed:
Apr. 26, 2001
Applicant:
Inventors:
Satoshi Yusa, Tokyo-to, JP;
Toshifumi Yokoyama, Tokyo-to, JP;
Shigeki Sumida, Tokyo-to, JP;
Toshiaki Motonaga, Tokyo-to, JP;
Yoshinori Kinase, Tokyo-to, JP;
Hiro-o Nakagawa, Tokyo-to, JP;
Chiaki Hatsuta, Tokyo-to, JP;
Junji Fujikawa, Tokyo-to, JP;
Masashi Ohtsuki, Tokyo-to, JP;
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A blank for halftone phase shift photomask is disclosed. The blank has a transparent substrate, a halftone phase shift layer and a light shielding film, the halftone phase shift layer and the light shielding film being layered in this order on the transparent substrate, and the l light shielding film is a single layered or multiple layered film which has a layer of tantalum.