Masashi Ohtsuki

Title: Masashi Ohtsuki: Innovator in Photomask Technology

Introduction

Masashi Ohtsuki is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His innovative approaches have paved the way for advancements in the manufacturing processes of photomasks.

Latest Patents

Ohtsuki's latest patents include a method for cleaning photo masks. This invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask. It eliminates the requirement for large-scale equipment for washing with a solution, streamlining the cleaning and inspection process while keeping production costs low. The method involves introducing a gaseous substituting substance to replace foreign substances on the photo mask and discharging them through a gas discharging hole. Additionally, he has developed a halftone phase shift photomask and a blank for halftone phase shift photomasks. This invention features a transparent substrate and a halftone phase shift layer that includes molybdenum silicide, enhancing the performance of photomasks.

Career Highlights

Masashi Ohtsuki is currently employed at Dai Nippon Printing Co., Ltd., where he continues to innovate in the field of photomask technology. His work has been instrumental in improving the efficiency and effectiveness of photomask production.

Collaborations

Ohtsuki has collaborated with notable colleagues such as Satoshi Yusa and Toshifumi Yokoyama. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Masashi Ohtsuki's contributions to photomask technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in photomask production, making him a valuable asset in the field.