The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Aug. 16, 2007
Shu Shimada, Tokyo, JP;
Noriyuki Takahashi, Tokyo, JP;
Hiroko Tanaka, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Yusuke Shoji, Tokyo, JP;
Masashi Ohtsuki, Tokyo, JP;
Shu Shimada, Tokyo, JP;
Noriyuki Takahashi, Tokyo, JP;
Hiroko Tanaka, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Yusuke Shoji, Tokyo, JP;
Masashi Ohtsuki, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo-to, JP;
Abstract
The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.