Tokyo, Japan

Shu Shimada



Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Shu Shimada

Introduction

Shu Shimada, an accomplished inventor based in Tokyo, Japan, has made significant contributions in the field of photolithography. With a total of four patents to his name, his innovative work primarily focuses on methods and devices that enhance the efficiency and cleanliness of light exposure masks.

Latest Patents

Among his latest patents, two inventions stand out for their ingenuity and applicability. The first, titled "Method for Managing Light Exposure Mask," aims to streamline the maintenance of light exposure masks by eliminating the need for mask or wafer inspections to manage contamination from foreign matter. This method ensures that the masks remain in a clean state throughout their usable period while also being cost-effective.

The second patent, "Gradated Photomask and Its Fabrication Process," introduces a novel gradated photomask. This invention simplifies the photolithography process by utilizing commonly available photomask blanks. It enhances alignment during the semi-transparent film's formation and ensures good step coverage, making it an invaluable asset in semiconductor manufacturing.

Career Highlights

Shu Shimada is currently employed by Dai Nippon Printing Co., Ltd., where he continues to develop innovative solutions that optimize production processes. His work plays a critical role in advancing the technologies used in photolithography, which is essential for the fabrication of integrated circuits.

Collaborations

Throughout his career, Shu has collaborated with notable professionals in the industry, including Noriyuki Takahashi and Hiroko Tanaka. These collaborations have further fueled the innovative spirit at Dai Nippon Printing, leading to groundbreaking advancements in their product offerings.

Conclusion

In summary, Shu Shimada exemplifies the innovative spirit necessary for advancing the field of photolithography. His recent patents not only address critical challenges within the industry but also highlight his commitment to developing efficient and effective technologies. As he continues his work at Dai Nippon Printing Co., Ltd., the impact of his inventions is sure to be felt across the semiconductor manufacturing landscape.

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