The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Aug. 16, 2007
Shu Shimada, Tokyo, JP;
Noriyuki Takahashi, Tokyo, JP;
Hiroyuki Nakajima, Tokyo, JP;
Hiroko Tanaka, Tokyo, JP;
Nobuyuki Kanda, Tokyo, JP;
Shu Shimada, Tokyo, JP;
Noriyuki Takahashi, Tokyo, JP;
Hiroyuki Nakajima, Tokyo, JP;
Hiroko Tanaka, Tokyo, JP;
Nobuyuki Kanda, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Takyo-to, JP;
Abstract
The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case.