Shigeki Sumida

Title: Shigeki Sumida: Innovator in Photomask Technology

Introduction

Shigeki Sumida is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on advancements that enhance the efficiency and effectiveness of photomasks used in semiconductor manufacturing.

Latest Patents

Sumida's latest patents include innovations in halftone phase shift photomasks. One of his notable inventions is a blank for a halftone phase shift photomask, which comprises a transparent substrate and a halftone phase shift layer. This layer is formed with molybdenum silicide as its major component, along with oxygen and nitrogen. The multilayer film structure enhances the photomask's performance. Another patent details a blank for halftone phase shift photomasks that includes a light shielding film layered on the transparent substrate, which is crucial for improving the quality of photolithography processes.

Career Highlights

Shigeki Sumida is associated with Dai Nippon Printing Co., Ltd., where he has been instrumental in developing cutting-edge photomask technologies. His expertise in this area has positioned him as a key figure in the industry, contributing to advancements that support the growing demands of semiconductor fabrication.

Collaborations

Throughout his career, Sumida has collaborated with notable colleagues, including Satoshi Yusa and Toshifumi Yokoyama. These partnerships have fostered an environment of innovation and have led to the successful development of several patents in the field.

Conclusion

Shigeki Sumida's contributions to photomask technology exemplify his dedication to innovation in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, making him a significant figure in his field.