The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 2004
Filed:
Apr. 10, 2001
Hiroshi Mohri, Tokyo, JP;
Toshiaki Motonaga, Tokyo, JP;
Chiaki Hatsuta, Tokyo, JP;
Norihito Ito, Tokyo, JP;
Naoya Hayashi, Tokyo, JP;
Toshio Onodera, Yokohama, JP;
Takahiro Matsuo, Yokohama, JP;
Toru Ogawa, Yokohama, JP;
Keisuke Nakazawa, Yokohama, JP;
Other;
Abstract
The invention relates to a halftone phase shift photomask whose transmittance and phase angle remain unchanged even when irradiated with an excimer laser used for exposure over an extended period of time, and a blank therefor, and provides a halftone phase shift mask comprising a pattern of halftone phase shift film containing at least chromium and fluorine on a transparent substrate , wherein optical characteristic changes upon irradiation with an exposure excimer laser have been reduced by patterning a film irradiated with light having a wavelength substantially absorbed by halftone phase shift film