Shizuoka-ken, Japan

Tomoyasu Kondo


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 49(Granted Patents)


Location History:

  • Chigasaki, JP (2001)
  • Susono, JP (2002)
  • Gotenba, JP (2002 - 2004)
  • Shizuoko-ken, JP (2012)
  • Shizuoka, JP (2013)
  • Shizuoka-ken, JP (2012 - 2014)

Company Filing History:


Years Active: 2001-2014

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10 patents (USPTO):Explore Patents

Title: **Innovations of Tomoyasu Kondo in Tantalum Nitride Film Technology**

Introduction

Tomoyasu Kondo, an accomplished inventor based in Shizuoka-ken, Japan, holds an impressive portfolio of ten patents. His work primarily focuses on advancements in film technology, particularly in the formation of tantalum nitride films that are essential in various industrial applications.

Latest Patents

Kondo's latest patents include a groundbreaking method for forming tantalum nitride films. This innovative technique involves introducing a raw gas that consists of a coordination compound of elemental tantalum, alongside hydrogen gas, into a film-forming chamber. The process results in a tantalum nitride film that is particularly rich in tantalum atoms, showcasing low resistance and minimal carbon and nitrogen content. This high-compositional ratio of tantalum to nitrogen (Ta/N) ensures excellent adherence to copper films, enabling the film to serve effectively as a barrier layer in various applications. Additionally, his patented cathode unit and sputtering apparatus exhibit a simplified design capable of producing high-quality coatings on complex substrate geometries, including micropores of high aspect ratios.

Career Highlights

Throughout his career, Tomoyasu Kondo has made significant contributions to the field of film technology while working with esteemed companies, including Ulvac, Inc. and Nihon Shinku Gijutsu Kabushiki Kaisha. His work at these organizations has been instrumental in pushing the boundaries of plasma and deposition technologies.

Collaborations

Kondo has collaborated with notable professionals in the industry, including Kyuzo Nakamura and Narishi Gonohe. These partnerships have fostered a fertile environment for creativity and innovation, allowing Kondo to refine his techniques and expand the application of his inventions.

Conclusion

Tomoyasu Kondo's innovations in tantalum nitride film technology have established him as a key figure in the field. With his extensive patent portfolio and collaborations with various experts and companies, Kondo continues to influence advancements in materials science and engineering, promoting greater efficiency and performance in film deposition processes.

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