The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2002
Filed:
Jan. 25, 2001
Youji Taguchi, Susono, JP;
Tomoyasu Kondo, Gotenba, JP;
Nihon Shinku Gijutsu Kabushiki Kaisha, Chigasaki, JP;
Abstract
The present invention provides an inductively coupled RF plasma source that can improve the nonuniformity in substrate treatment by canceling out the radial electric fields generated between a plasma and an antenna coil. The inductively coupled RF plasma source comprises a plurality of one-turn antenna coils, each having one end connected to a RF supply along a circumferential side wall of a plasma generating chamber and the other end connected to a grounding potential, arranged at intervals in the longitudinal axial direction of the plasma generating chamber. One end of each one-turn antenna coil displaced at equal angles from each other in a circumferential direction.