The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Apr. 13, 2000
Kuniaki Nakajima, Chigasaki, JP;
Tomoyasu Kondo, Chigasaki, JP;
Tsuyoshi Sahoda, Chiba, JP;
Yasushi Higuchi, Chiba, JP;
Takashi Komatsu, Chiba, JP;
Nihon Shinku Gijutsu Kabushiki Kaisha, Kanagawa, JP;
Abstract
A sputtering device enabling a small incident angle. A plurality of shield plates provided with holes at the same positions as targets are arranged in a vacuum chamber. Sputtering particles ejected diagonally from the targets,become attached to the shield plates,and only particles ejected vertically reach the surface of a substrate,As a result, it is possible to uniformly form a thin film inside microscopic holes of high aspect ratio. If sputtering gas is introduced close to the targets,, reactant gas is introduced close to the substrate,and evacuation carried out close to the substrate,reactant gas does not reach the targets,side. Consequently, it is possible to prevent deterioration of the surfaces of the targets,.