Sanbu-gun, Japan

Tsuyoshi Sahoda


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Chiba, JP (2001)
  • Sanbu-gun, JP (2002)

Company Filing History:


Years Active: 2001-2002

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2 patents (USPTO):Explore Patents

Title: Innovations by Tsuyoshi Sahoda

Introduction

Tsuyoshi Sahoda is a notable inventor based in Sanbu-gun, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of sputtering devices used in film deposition processes.

Latest Patents

Sahoda's latest patents include innovative sputtering devices designed to improve the deposition of films on substrates. The first patent describes a sputtering device that efficiently guides sputtering particles ejected from a target to a film deposition subject. This device prolongs the interval at which a stick preventive member requires replacement. It features a vacuum chamber where a specified sputtering target faces a substrate, allowing for effective film deposition using sputtering particles. Additionally, the device includes particle ejection sections that slope at a specified angle of 30° to 60° with respect to the substrate surface, enhancing the deposition process.

The second patent presents a sputtering device that enables a small incident angle. This device incorporates a plurality of shield plates with holes aligned with the targets, arranged within a vacuum chamber. Sputtering particles ejected diagonally from the targets attach to the shield plates, while only vertically ejected particles reach the substrate surface. This design allows for the uniform formation of thin films inside microscopic holes of high aspect ratio. By introducing sputtering gas close to the targets and reactant gas near the substrate, the device prevents the deterioration of the target surfaces.

Career Highlights

Tsuyoshi Sahoda is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to innovate in the field of sputtering technology. His work has contributed to advancements in the manufacturing processes of thin films, which are essential in various applications, including electronics and optics.

Collaborations

Sahoda has collaborated with notable coworkers, including Kuniaki Nakajima and Tomoyasu Kondo. Their combined expertise has furthered the development of innovative sputtering technologies.

Conclusion

Tsuyoshi Sahoda's contributions to sputtering technology through his patents demonstrate his commitment to innovation in the field. His work continues to influence the efficiency of film deposition processes, showcasing the importance of advancements in this area.

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