Chiba, Japan

Yasushi Higuchi

This inventor holds 6 USPTO granted patents. Top assignee: Nihon Shinku Gijutsu Kabushiki Kaisha. Active years: 1989-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasushi Higuchi. Retrieved from https://idiyas.com/inventor/yasushi-higuchi-q1mm076p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.9

ph-index = 6

Forward Citations = 70(Granted Patents)


Location History:

  • Yachimata, JP (1989 - 1992)
  • Yachimatamachi, JP (1993)
  • Chiba, JP (2001)
  • Sanbu-gun, JP (2002)

Company Filing History:


Years Active: 1989-2002

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6 patents (USPTO):Explore Patents

Title: Innovations in Sputtering Technology by Inventor Yasushi Higuchi

Introduction

Yasushi Higuchi, an accomplished inventor based in Chiba, Japan, has made significant contributions to the field of sputtering technology. With a total of six patents to his name, Higuchi continues to push the boundaries of innovation in materials deposition methods.

Latest Patents

Among his latest inventions, Higuchi has developed a sputtering device designed to enhance the efficiency of film deposition processes. This device ingeniously guides sputtering particles ejected from a target to the substrate while prolonging the life of the stick preventive member. The innovation includes a vacuum chamber, where a sputtering target is positioned facing the substrate, allowing for precise film deposition onto the substrate's surface. Furthermore, Higuchi's sputtering device features particle ejection sections that are inclined at a specific angle between 30° to 60°, which optimizes the direction of sputtering particles.

In addition, he has patented a composite sputtering cathode assembly and a related sputtering apparatus. This apparatus comprises a vacuum housing and a substrate holder, as well as multiple targets and shields strategically positioned to ensure that only those sputtering particles directed perpendicularly to the substrate reach it. This innovation ensures uniformity in film thickness as it employs a rotating mechanism between the substrate and the targets.

Career Highlights

Yasushi Higuchi has dedicated his professional career to advancing sputtering technologies. His work at Nihon Shinku Gijutsu Kabushiki Kaisha has been instrumental in the development and enhancement of sputtering equipment widely utilized in various industrial applications. Higuchi's patents reflect his commitment to improving processes and achieving higher efficiencies in film deposition.

Collaborations

Higuchi has worked alongside talented colleagues, including Kyuzo Nakamura and Takashi Komatsu. Together, they have explored innovative ideas and joint research endeavors, contributing significantly to their field and enhancing the company's capabilities in sputtering technology.

Conclusion

With a strong portfolio of patents and a career dedicated to innovation, Yasushi Higuchi stands out as a leading inventor in the sputtering technology domain. His recent work not only demonstrates his technical expertise but also emphasizes the importance of collaboration in driving advancements in this field. As the industry evolves, Higuchi's contributions will undoubtedly continue to shape the landscape of materials deposition technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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