Susono, Japan

Kuniaki Nakajima


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Chigasaki, JP (2001)
  • Susono, JP (2002)

Company Filing History:


Years Active: 2001-2002

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Kuniaki Nakajima: Innovator in Sputtering Technology

Introduction

Kuniaki Nakajima is a notable inventor based in Susono, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of sputtering devices used in film deposition processes.

Latest Patents

One of Nakajima's latest patents is a sputtering device designed to efficiently guide sputtering particles ejected from a target to a film deposition subject. This innovation prolongs the interval at which a stick preventive member requires replacement. The device features a vacuum chamber where a specified sputtering target faces a substrate, allowing for the deposition of a film using sputtering particles. Additionally, the sputtering device includes particle ejection sections that slope at a specified angle of 30° to 60° with respect to the substrate surface, enhancing the deposition process.

Another significant patent by Nakajima is a sputtering device that enables a small incident angle. This device incorporates a plurality of shield plates with holes aligned with the targets, arranged within a vacuum chamber. Sputtering particles ejected diagonally from the targets attach to the shield plates, while only vertically ejected particles reach the substrate surface. This design allows for the uniform formation of thin films inside microscopic holes of high aspect ratio, preventing the deterioration of target surfaces.

Career Highlights

Kuniaki Nakajima is associated with Nihon Shinku Gijutsu Kabushiki Kaisha, where he continues to innovate in the field of sputtering technology. His work has been instrumental in advancing the capabilities of sputtering devices, making them more efficient and effective for various applications.

Collaborations

Nakajima has collaborated with notable coworkers, including Tomoyasu Kondo and Tsuyoshi Sahoda. Their combined expertise has contributed to the development of advanced sputtering technologies.

Conclusion

Kuniaki Nakajima's contributions to sputtering technology have made a significant impact in the field. His innovative patents reflect his commitment to enhancing film deposition processes, showcasing his role as a leading inventor in this area.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…