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Tomoharu Yoshino

USPTO Granted Patents = 23 (Patent Applications = 11)

EPO Patents = 9 (Patent Applications = 17)

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 9(Granted Patents)

Company Filing History:

Samsung Electronics Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2016-2025

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23 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12480207 - Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compound (2025-11-25),

2. 12415821 - Tin compound, thin-film forming raw material containing said compound, thin film formed from said thin-film forming raw material, method of producing said thin film using said compound as precursor, and method of producing said thin film (2025-09-16),

3. 12371778 - Cobalt compound, thin-film forming raw material, thin-film, and method of producing thin-film (2025-07-29),

4. 12275748 - Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin film (2025-04-14),

5. 11760771 - Ruthenium compound, raw material for forming thin film, and method for producing thin film (2023-09-19),

6. 11623935 - Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound (2023-04-11),

7. 11618762 - Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound (2023-04-04),

8. 11555044 - Thin-film forming raw material for use in atomic layer deposition method, thin-film forming raw material, method for producing thin-film, and compound (2023-01-17),

9. 11161867 - Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound (2021-11-02),

10. 10920313 - Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film (2021-02-16),

11. 10882874 - Vanadium compound (2021-01-05),

12. 10364495 - Method for producing a thin film (2019-07-30),

13. 10351584 - Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound (2019-07-16),

14. 10253408 - Compound, thin film-forming material, and thin film manufacturing method (2019-04-09),

15. 10167304 - Ruthenium compound, material for thin film formation, and process for thin film formation (2019-01-01),

Title: The Innovative Contributions of Tomoharu Yoshino

Introduction

Tomoharu Yoshino, an accomplished inventor based in Tokyo, Japan, has made significant strides in the field of materials science. With a remarkable number of 19 patents to his name, his innovations have contributed extensively to the development of thin-film technology.

Latest Patents

Among his latest advancements, Yoshino has developed innovative ruthenium compounds that serve as raw materials for forming thin films. These compounds are described by a general formula that showcases their utility in producing thin films efficiently. One of his notable patents involves a method of producing thin films using these ruthenium compounds, highlighting their effectiveness in the thin film production process.

Furthermore, he has introduced a raw material designed for use in the atomic layer deposition method. This material includes an alkoxide compound, which is represented by a specific general formula. The versatility of the compounds, including hydrogen or alkyl groups, demonstrates his deep understanding of chemical engineering and its applications in manufacturing technologies.

Career Highlights

Tomoharu Yoshino has held prominent positions at leading companies, including Adeka Corporation and Samsung Electronics Co., Ltd. His work in these organizations has allowed him to push the boundaries of innovation in materials for electronic applications.

Collaborations

Collaborating with skilled professionals such as Atsushi Sakurai and Akihiro Nishida has played a crucial role in Yoshino's journey as an inventor. These partnerships have enriched his projects, fostering a dynamic environment for creativity and technological advancement.

Conclusion

In conclusion, Tomoharu Yoshino's contributions to the field of thin-film technology and materials science are noteworthy. His various patents reflect his innovative spirit and dedication to advancing technology. As he continues to explore new avenues in his research, the impact of his work will undoubtedly shape future developments in this vital field.

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