The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2023
Filed:
Dec. 03, 2019
Applicant:
Adeka Corporation, Tokyo, JP;
Inventors:
Atsushi Sakurai, Tokyo, JP;
Masako Hatase, Tokyo, JP;
Tomoharu Yoshino, Tokyo, JP;
Akihiro Nishida, Tokyo, JP;
Atsushi Yamashita, Tokyo, JP;
Assignee:
ADEKA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C23C 16/455 (2006.01); C07F 7/22 (2006.01);
U.S. Cl.
CPC ...
C07F 7/2224 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01);
Abstract
Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including an alkoxide compound represented by the following general formula (1): where Rrepresents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Rand Reach independently represent an alkyl group having 1 to 5 carbon atoms, and zrepresents an integer of from 1 to 3.
Sakurai, Atsushi. (2023). Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound (U.S. Patent No. 11623935). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11623935
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile