The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2021
Filed:
Jul. 05, 2017
Applicant:
Adeka Corporation, Tokyo, JP;
Inventors:
Tomoharu Yoshino, Tokyo, JP;
Masaki Enzu, Tokyo, JP;
Akihiro Nishida, Tokyo, JP;
Atsushi Yamashita, Tokyo, JP;
Assignee:
ADEKA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C07C 251/08 (2006.01); C07F 13/00 (2006.01); C07F 15/04 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C07C 251/08 (2013.01); C07F 13/005 (2013.01); C07F 15/045 (2013.01); C23C 16/45553 (2013.01); C07F 15/04 (2013.01);
Abstract
A diazadienyl compound represented by General Formula (I) below: wherein Rrepresents a Clinear or branched alkyl group, and M represents nickel atom or manganese atom. In particular, since a compound in which Rin General Formula (I) is a methyl group has a high vapor pressure and a high thermal decomposition starting temperature, the compound is useful as a raw material for forming a thin film by a CVD method or ALD method.