Tokyo, Japan

Masaki Enzu

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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10 patents (USPTO):Explore Patents

Title: The Innovative Work of Masaki Enzu

Introduction

Masaki Enzu is a distinguished inventor based in Tokyo, Japan, renowned for his contributions in the field of thin-film technology. With an impressive portfolio of 10 patents, he has made significant advancements that enhance material properties and production methodologies.

Latest Patents

Among his latest inventions are a ruthenium compound and a thin-film forming raw material, both pivotal for modern thin-film applications. The first patent introduces a unique ruthenium compound represented by specific formulas, intended for use as a thin-film forming raw material. This innovation highlights the versatility of the compound, where the substituents can be hydrogen, alkyl groups, or fluorine-containing groups, showcasing an adaptable approach to thin-film production. The second patent closely relates to manufacturing thin films using a similar compound, further emphasizing the role of fluorine-containing groups in enhancing material performance.

Career Highlights

Masaki has spent a significant part of his career at Adeka Corporation, a leading company in the chemical industry. His work has been characterized by a commitment to innovation in materials science, specifically focusing on developing high-performance compounds suitable for various applications.

Collaborations

Throughout his career, Masaki has had the privilege of collaborating with esteemed coworkers such as Tomoharu Yoshino and Masako Hatase. These partnerships have fostered an environment of creativity and innovation, leading to the successful development of cutting-edge technologies that are making their mark in the industry.

Conclusion

Masaki Enzu continues to push the boundaries of technology with his innovative contributions to thin-film materials and methods. His patents are a testament to his dedication and expertise in this specialized field, contributing to advancements that will influence various applications in the future.

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