The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Nov. 07, 2014
Applicant:
Adeka Corporation, Tokyo, JP;
Inventors:
Masako Hatase, Tokyo, JP;
Masaki Enzu, Tokyo, JP;
Atsushi Sakurai, Tokyo, JP;
Tomoharu Yoshino, Tokyo, JP;
Assignee:
ADEKA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01); C07C 225/14 (2006.01); C23C 16/16 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 15/0046 (2013.01); C07C 225/14 (2013.01); C23C 16/16 (2013.01); C23C 16/45553 (2013.01);
Abstract
Disclosed is a ruthenium compound useful as a precursor in chemical vapor growth, particularly ALD. The compound has good reactivity with a reactive gas, a high vapor pressure, and a low melting point. The compound is represented by general formula (I), wherein R, R, and Reach independently represent a straight or branched chain alkyl group having 1 to 5 carbon atoms, provided that the total number of the carbon atoms of Rand Ris 3 to 10. In formula (I), Rand Rare each preferably ethyl or isopropyl.