The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

May. 15, 2017
Applicant:

Adeka Corporation, Tokyo, JP;

Inventors:

Makoto Okabe, Tokyo, JP;

Akihiro Nishida, Tokyo, JP;

Tomoharu Yoshino, Tokyo, JP;

Assignee:

ADEKA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 9/00 (2006.01); C23C 16/18 (2006.01); H01L 21/285 (2006.01); C07C 251/08 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 9/005 (2013.01); C07C 251/08 (2013.01); C07F 9/00 (2013.01); C23C 16/18 (2013.01); C23C 16/34 (2013.01); C23C 16/45553 (2013.01); H01L 21/285 (2013.01);
Abstract

A vanadium compound represented by following General Formula (1). In General Formula (1), Rrepresents a linear or branched alkyl group having 1 to 7 carbon atoms and n represents a number from 2 to 4. Rpreferably represents a secondary alkyl or a tertiary alkyl. It is preferred that in General Formula (1), n is 2 and Ris tert-butyl group or tert-pentyl group, since the compound has a broad ALD window and high thermal decomposition temperature to be able to form a good quality vanadium-containing thin film that has a small carbon residue when used as an ALD material.


Find Patent Forward Citations

Loading…