IDiyas

For the Inventor, By the Inventor

Tokyo, Japan

Tohru Ando

USPTO Granted Patents = 18 

Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Tokyo, JE (2017)
  • Tokyo, JP (2010 - 2019)

Company Filing History:

goldMedal18 out of 2,874 
 
Hitachi-high-technologies Corporation
 patents

Years Active: 2010-2019

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18 patents (USPTO):
1. 10176968 - Method for adjusting charged particle beam device and adjusting beam aperture based on a selected emission condition and charged particle beam device for same (2019-01-08),
2. 9792832 - Charged particle beam apparatus, specimen observation system and operation program (2017-10-17),
3. 9741531 - Charged particle beam device enabling facilitated EBSD detector analysis of desired position and control method thereof (2017-08-22),
4. D780767 - Display screen with graphical user interface (2017-03-07),
5. D774516 - Display screen with graphical user interface (2016-12-20),
6. D774075 - Display screen with graphical user interface (2016-12-13),
7. 9412557 - Charged particle beam apparatus and program (2016-08-09),
8. 9129773 - Charged particle beam apparatus (2015-09-08),
9. 8754664 - Inspection method and device (2014-06-17),
10. 8442300 - Specified position identifying method and specified position measuring apparatus (2013-05-14),
11. 8309922 - Semiconductor inspection method and device that consider the effects of electron beams (2012-11-13),
12. 8178840 - Specimen inspection equipment and how to make the electron beam absorbed current images (2012-05-15),
13. 8178837 - Logical CAD navigation for device characteristics evaluation system (2012-05-15),
14. 8067752 - Semiconductor testing method and semiconductor tester (2011-11-29),
15. 7989766 - Sample inspection apparatus (2011-08-02),

Title: Tohru Ando: Innovator in Charged Particle Beam Technology

Introduction

Tohru Ando is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of charged particle beam technology. With a total of 18 patents to his name, Ando has developed innovative solutions that enhance the usability and functionality of charged particle beam devices.

Latest Patents

Among his latest patents, Ando has introduced a method for adjusting charged particle beam devices and beam apertures based on selected emission conditions. This invention aims to simplify the operation of versatile charged particle beam devices, making them accessible to less-experienced operators while ensuring high-resolution imaging. The device includes a charged particle source, focusing lenses, a movable objective aperture, and a detector for secondary signals from samples. The operation controller plays a crucial role in selecting emission conditions and adjusting the primary charged particle beam accordingly.

Career Highlights

Tohru Ando is currently employed at Hitachi High-Technologies Corporation, where he continues to push the boundaries of charged particle beam technology. His work has significantly impacted the field, particularly in improving the operational efficiency of electron microscopes and other related devices.

Collaborations

Ando collaborates with notable colleagues such as Tsutomu Saito and Yasuhiko Nara, contributing to advancements in their shared field of expertise.

Conclusion

Tohru Ando's innovative work in charged particle beam technology exemplifies the importance of continuous improvement in scientific instruments. His patents not only enhance the functionality of these devices but also make them more user-friendly for operators of varying experience levels.

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