The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

May. 21, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Kazuyuki Takeda, Tokyo, JP;

Tohru Ando, Tokyo, JP;

Tsutomu Saito, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/26 (2006.01); H01J 37/244 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/20207 (2013.01); H01J 2237/20221 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/2804 (2013.01);
Abstract

A charged particle beam device allowing an analysis position in a sample analyzable with an EBSD detector to be acquired beforehand, and allowing a sample to be adjusted to a desired analysis position in a short time. A charged particle beam device is provided with a charged particle source (), a charged particle optical system (), an EBSD detector (), a sample stage (), an image display unit () for displaying a portion of the sample observable with the EBSD detector and a non-observable portion of the sample such that said portions are distinguished from each other, an operation input unit () where a position to be observed by the EBSD detector is entered, and a control unit () for controlling a planar movement, an inclination movement and a rotation movement of the sample stage so as to allow the observation position entered from the operation input unit to be observed with the EBSD detector.


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