Company Filing History:

10 out of 14,705

Infineon Technologies Ag

patents

3 out of 13

Infineon Technologies Sc300 Gmbh & Co., Kg

patents

2 out of 11

Advanced Mask Technology Center Gmbh + Co. Kg

where one patent can have more than one assignee

Years Active: 2003-2022

where 'Filed Patents' based on already Granted Patents

15 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11537039 - Photomask assembly with reflective photomask and method of manufacturing a reflective photomask (2022-12-27),

2. 10031409 - Reflective photomask and reflection-type mask blank (2018-07-24),

3. 8097955 - Interconnect structures and methods (2012-01-17),

4. 7304716 - Method for purging an optical lens (2007-12-04),

5. 7248365 - Method for adjusting a substrate in an appliance for carrying out exposure (2007-07-24),

6. 7186484 - Method for determining the relative positional accuracy of two structure elements on a wafer (2007-03-06),

7. 6979522 - Method for exposing at least one or at least two semiconductor wafers (2005-12-27),

8. 6908775 - Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer (2005-06-21),

9. 6892108 - Method for adjusting processing parameters of at least one plate-shaped object in a processing tool (2005-05-10),

10. 6887722 - Method for exposing a semiconductor wafer (2005-05-03),

11. 6861331 - Method for aligning and exposing a semiconductor wafer (2005-03-01),

12. 6806008 - Method for adjusting a temperature in a resist process (2004-10-19),

13. 6780552 - Method for controlling the quality of a lithographic structuring step (2004-08-24),

14. 6684124 - Method for controlling a processing device for a sequential processing of semiconductor wafers (2004-01-27),

15. 6593254 - Method for clamping a semiconductor device in a manufacturing process (2003-07-15),

Title: Thorsten Schedel: Innovator in Photomask Technology

Introduction

Thorsten Schedel is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of photomask technology, holding a total of 15 patents. His work focuses on advancements that enhance the manufacturing processes and performance of reflective photomasks.

Latest Patents

Among his latest patents are two notable inventions. The first is a "Photomask assembly with reflective photomask and method of manufacturing a reflective photomask." This invention features a reflective photomask that includes a substrate and a reflective multilayer on its front side. Additionally, it incorporates a protection structure on the backside that can be detached at temperatures below 150 degrees Celsius. The second patent is for a "Reflective photomask and reflection-type mask blank." This invention utilizes a substrate made of low thermal expansion material, designed with a multilayer mirror that achieves at least 50% reflectivity at exposure wavelengths below 15 nm.

Career Highlights

Thorsten Schedel has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Infineon Technologies SC300 GmbH & Co. KG. His experience in these organizations has allowed him to develop innovative solutions that address the challenges in photomask manufacturing.

Collaborations

Throughout his career, Schedel has collaborated with talented professionals, including Sebastian Schmidt and Heiko Hommen. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Thorsten Schedel is a key figure in the field of photomask technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to influence the industry and pave the way for future advancements.

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