The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Sep. 24, 2004
Heiko Hommen, Dresden, DE;
Jens Stäcker, Dresden, DE;
Maria DE LA Piedad Fernandez-martinez, Dresden, DE;
Jens Uwe Bruch, Dresden, DE;
Thorsten Schedel, Dresden, DE;
Heiko Hommen, Dresden, DE;
Jens Stäcker, Dresden, DE;
Maria de la Piedad Fernandez-Martinez, Dresden, DE;
Jens Uwe Bruch, Dresden, DE;
Thorsten Schedel, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A measurement mark () for determining the relative positional accuracy of a progressive projection onto a wafer (), the projection being performed with two masks (), comprising two structure elements () formed on a respective one of the masks (). The structure elements () overlap with regard to their position on the masks so that, during the projection of the second structure element (), an electrically conductive structure () formed on the basis of the first structure element on the wafer () is overformed by removal of a portion (). In an electrical line width measurement, the reduced width (CD, CD) of the structure () is measured and compared either with the original width () or with that width (CD) of a further partial element () produced by the overforming.