Jens Uwe Bruch

Title: Jens Uwe Bruch: Innovator in Photolithography Techniques

Introduction

Jens Uwe Bruch is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of photolithography, particularly in methods that enhance the precision of exposure techniques. With a total of 2 patents, his work is recognized for its innovative approaches to complex manufacturing processes.

Latest Patents

Bruch's latest patents include a "Method for carrying out a double or multiple exposure" and a "Method for determining the relative positional accuracy of two structure elements on a wafer." The first patent describes a system where mutually associated structure patterns can be received by a mask substrate holder, allowing for efficient double or multiple exposures without the need for realignment. The second patent focuses on a measurement mark that determines the positional accuracy of structure elements on a wafer, ensuring high precision in electrical line width measurements.

Career Highlights

Jens Uwe Bruch is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has positioned him as a key player in advancing photolithography techniques, which are essential for the production of microelectronic devices.

Collaborations

Bruch collaborates with talented professionals such as Jens Stäcker and Heiko Hommen, contributing to a dynamic team that drives innovation in their field.

Conclusion

Jens Uwe Bruch's contributions to photolithography and his innovative patents reflect his expertise and commitment to advancing technology. His work continues to influence the semiconductor industry and enhance manufacturing processes.