The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Sep. 24, 2004
Jens Stäcker, Dresden, DE;
Heiko Hommen, Dresden, DE;
Jens Uwe Bruch, Dresden, DE;
Marlene Strobl, ShiLin, TW;
Karl Schumacher, Dresden, DE;
Jens Stäcker, Dresden, DE;
Heiko Hommen, Dresden, DE;
Jens Uwe Bruch, Dresden, DE;
Marlene Strobl, ShiLin, TW;
Karl Schumacher, Dresden, DE;
Infineon Technologies, AG, Neubiberg, DE;
Abstract
The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.